Moxtek HPC 150W 75kV X-ray tubes are designed to be used in XRF and imaging applications. The tube is designed to be air-cooled and the cooling can be adapted to meet specific needs. The push/pull fan configuration makes it easy to direct the warm air outward. For XRF applications the cone is designed for a vacuum seal at its base. The HPC tube incorporates radiation shielding.

Nanoimprint Lithography (NIL) has demonstrated the ability to replicate nano-structures within extremely tight tolerances. The process concept and lab sample implementation has been around for a long time. Scaling up has introduced a number of barriers that have taken some time to overcome. In this paper, we discuss the implementation of full wafer NIL in to an established Wire-Grid Polarizer (WGP) manufacturing line. In doing this we have demonstrated that NIL can be utilized effectively to mass produce various nano-structures that are challenging and cost prohibitive for conventional lithography techniques.

MOXTEK (Orem, UT) is excited to celebrate the landing of the Perseverance rover in the Mars Jezero crater on February 18th 2021. This landing will be watched by many people around the world with anticipation as this new high‐tech rover is delivered to our red planet neighbor. Moxtek employees will also be anxiously watching as this rover, with three Moxtek products, prepares for a safe landing. Please celebrate this landing with us on February 18th @ 1:55pm MST (Utah time).

Moxtek HPC 150W 60kV X-ray tubes are designed to be used in XRF and imaging applications. The tube is designed to be air-cooled and the cooling can be adapted to meet specific needs. The push/pull fan configuration makes it easy to direct the warm air outward. For XRF applications the cone is designed for a vacuum seal at its base. The HPC tube incorporates radiation shielding.

The basic premise of XRF is that high energy x-rays are aimed at a sample and then the atoms in the sample may absorb an x-ray. This ionizes the atom by displacing an electron from one of the shells close to the atom. The next step is for an electron from an outer shell to fall into the shell vacancy, emitting the excess energy in the form of characteristic x-ray radiation. The energy of the x-ray is dependent on the energy levels of the shells participating in the process and therefore is “characteristic” to the material of the sample. A critical detail for the x-ray source used for XRF is that x-ray source needs to produce x-rays at energies higher than absorption edge of the element in order to ionize the atom. Every element has different absorption edges, just as they have different characteristic x-ray lines. The x-ray source needs to be tuned in various ways for effective detection of different elements. There are three basic methods for tuning the spectrum-shape from the x-ray source: • Setting the high voltage on the x-ray tube. • Putting an x-ray filter between the x-ray source and the sample. • Selection of the anode material on the x-ray tube. This report will focus on the selection of the anode material on the x-ray tube. For additional information about setting the high voltage or selecting a filter please go to www.moxtek.com and select the “Consult our Experts” option in the bottom right of the page.

ProFlux wire-grid polarizers are made of mirror quality aluminum patterned on glass wafers. The size and structure of the grid makes it very susceptible to physical damage and contamination. Because of the fragile nature of the wire-grid, it is necessary to follow proper handling guidelines. Damage to the wire-grid from mishandling is not covered in the warranty and Moxtek will not refund parts damaged from mishandling. Follow the handling and care information below to prevent damage to the wire-grid surface ensuring consistent performance.

MOXTEK has developed 8-inch nanoimprint processes to manufacture subwavelength 3-D nanostructures. We offer imprinting, etching, and fabrication capabilities for your product needs on glass-like wafers and have successfully tested silicon, display glass, and sapphire as substrate materials. We also demonstrated the capability to imprint a 4-state pixelated aluminum wire-grid polarizer with 7μm pixel pitch and 144nm wire pitch as shown in the images below. Thus far, Moxtek has imprinted feature sizes less than 30nm wide and less than 50nm tall.