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Volume Manufacturing of Full Wafer Nanoimprint on Wire Grid Polarizers

By Collin Hayward · Optics PDFs · 31/07/21

Nanoimprint Lithography (NIL) has demonstrated the ability to replicate nano-structures within extremely tight tolerances. The process concept and lab sample implementation has been around for a long time. Scaling up has introduced a number of barriers that have taken some time to overcome. In this paper, we discuss the implementation of full wafer NIL in to an established Wire Grid Polarizer (WGP) manufacturing line. In doing this we have demonstrated that NIL can be utilized effectively to mass produce various nano-structures that are challenging and cost prohibitive for conventional lithography techniques.
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