Nanoimprint Lithography (NIL) has demonstrated the ability to replicate nano-structures within extremely tight tolerances. The process concept and lab sample implementation has been around for a long time. Scaling up has introduced a number of barriers that have taken some time to overcome. In this paper, we discuss the implementation of full wafer NIL in to an established Wire-Grid Polarizer (WGP) manufacturing line. In doing this we have demonstrated that NIL can be utilized effectively to mass produce various nano-structures that are challenging and cost prohibitive for conventional lithography techniques.