• For details about Moxtek employment opportunities, please visit the Careers page

  • This field is for validation purposes and should be left unchanged.
Articles

MOXTEK has developed 8-inch nanoimprint processes to manufacture subwavelength 3-D nanostructures. We offer imprinting, etching, and fabrication capabilities for your product needs on glass-like wafers and have successfully tested silicon, display glass, and sapphire as substrate materials. We also demonstrated the capability to imprint a 4-state pixelated aluminum wire-grid polarizer with 7μm pixel pitch and […] View document

Articles

MOXTEK’s broadband wire-grid polarizers provide excellent polarization contrast and transmission at wide cone angles. These inorganic polarizers are extremely small and are designed to tolerate high temperatures. Moxtek wire-grids are made of high purity materials which provide great optical properties but are susceptible to damage from water and oils droplets. Moxtek has developed the HTS […] View document

Notes

Nanoimprint Lithography (NIL) has demonstrated its value in manufacturing nanostructures with extremely tight tolerances for the optics industry. A key component of NIL consists of obtaining precision masters to use in producing stamps for mass replication. Silicon wafers are an ideal base material for these masters due to their considerable use in standard semiconductor processes. […] View document

Articles

April 29, 2020 – MOXTEK announces the transfer of the ICE Cube™ wire-grid polarizing beamsplitter (PBS) product line to Meadowlark Optics. View document

Datasheets
Articles

Moxtek offers state of the art NIL volume manufacturing on 8-inch wafers. We have demonstrated stamp life up to 1300 prints with SPC monitoring of CD repeatability down to 30nm. View document

Articles
Datasheets

ProFlux® Nanowire® Ultraviolet polarizers offer excellent solutions for UV and DUV applications. High transmission and high contrast choices are available. View document

Datasheets