Tuesday, 9 March, 2021
The basic premise of XRF is that high energy x-rays are aimed at a sample and then the atoms in the sample may absorb an x-ray. This ionizes the atom by displacing an electron from one of the shells close to the atom. The next step is for an electron from an outer shell to fall into the shell vacancy, emitting the excess energy in the form of characteristic x-ray radiation. The energy of the x-ray is dependent on the energy levels of the shells participating in the process and therefore is “characteristic” to the material of the sample.
A critical detail for the x-ray source used for XRF is that x-ray source needs to produce x-rays at energies higher than absorption edge of the element in order to ionize the atom. Every element has different absorption edges, just as they have different characteristic x-ray lines. The x-ray source needs to be tuned in various ways for effective detection of different elements.
There are three basic methods for tuning the spectrum-shape from the x-ray source:
• Setting the high voltage on the x-ray tube.
• Putting an x-ray filter between the x-ray source and the sample.
• Selection of the anode material on the x-ray tube.
This report will focus on the selection of the anode material on the x-ray tube. For additional information about setting the high voltage or selecting a filter please go to
www.moxtek.com and select the “Consult our Experts” option in the bottom right of the page.
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Tuesday, 26 January, 2021
ProFlux wire-grid polarizers are made of mirror quality aluminum patterned on glass wafers. The size and structure of the grid makes it very susceptible to physical damage and contamination.
Because of the fragile nature of the wire-grid, it is necessary to follow proper handling guidelines. Damage to the wire-grid from mishandling is not covered in the warranty and Moxtek will not refund parts damaged from mishandling. Follow the handling and care information below to prevent damage to the wire-grid surface ensuring consistent performance.
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Friday, 11 December, 2020
MOXTEK has developed 8-inch nanoimprint processes to manufacture subwavelength
3-D nanostructures. We offer imprinting, etching, and fabrication capabilities
for your product needs on glass-like wafers and have successfully tested silicon,
display glass, and sapphire as substrate materials. We also demonstrated the capability
to imprint a 4-state pixelated aluminum wire-grid polarizer with 7μm pixel pitch
and 144nm wire pitch as shown in the images below. Thus far, Moxtek has imprinted
feature sizes less than 30nm wide and less than 50nm tall.
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Friday, 11 December, 2020
MOXTEK’s broadband wire-grid polarizers provide excellent polarization contrast and transmission at wide cone angles. These inorganic polarizers are extremely small and are designed to tolerate high temperatures.
(more…)
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Thursday, 30 April, 2020
April 29, 2020 – MOXTEK announces the transfer of the ICE Cube™ wire-grid polarizing beamsplitter (PBS) product line to Meadowlark Optics.
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Monday, 23 March, 2020
Fluorescence and label free based detection methods serve as very effective means to identify and detect literally any biomolecule of interest. Though very useful, both methods offer relatively low signal to noise ratios (SNRs). By incorporating metallic nanostructures, which provide highly focused and enhanced optical fields, one can boost the SNR by several orders of magnitude, thereby resulting in a highly enhanced fluorescence response. Furthermore, nanofocusing of the light at the metallic surface allows for label free sensing of target biomolecules. Building on years of expertise, Moxtek has developed inexpensive and reliable methods to obtain uniform wafer scale metallic and dielectric nanostructures that can be used as Biochips for these applications. Additionally, our nanofabrication expertise at Moxtek allows us to also provide numerous photonic crystal based structures.
See the PDF here.
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Monday, 3 February, 2020
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Thursday, 5 December, 2019
MOXTEK has been producing nanostructured optical components for over 20 years. We offer high volume wafer replication of various nanostructure devices. Our versatile capabilities are used to manufacture functional nanostructure devices including: metalens arrays, waveguides, patterned metasurfaces, Diffractive Optical Elements (DOEs), photonics crystals, and biosensor arrays. These devices are used for imaging, illumination, and display systems for a variety of applications including: automotive, medical/dental imaging, camera systems, and many others.
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Monday, 4 November, 2019
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Monday, 19 August, 2019
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