「雷射式刻蝕技術」

Step 1 of 3

Step 1 of 3: Contact Information
Date Product Needed
MM slash DD slash YYYY
Company*
First Name*
Last Name*
Phone*
Street Address
Email*
State / Province / Region
City
Country*
Postal Code*
Product Group*
Referred By
Other
Attach Document
Accepted file types: pdf, doc, docx, xls, xlsx, jpg, jpeg, png, gif, tiff, dwg, Max. file size: 10 MB.

Step 2 of 3: Product Selection
Product Type*
Specific Wavelength Range (nm)
Is Tp or Contrast Ratio more important?
Product Shape*
Dimension (X) in mm*
Dimension (Y) in mm*
X Dimensional Tolerance in mm: +/- 0.
Y Dimensional Tolerance in mm: +/- 0.
Transmission Axis (long side, degrees)
Quantity*
Visual Criteria*
Edge Exclusion (mm)
Additional Options
Product Requirements
Other
X-ray Subject*
Other
X-ray Application
X-ray Sources
Specify Product*
40kV/4W Cabled Transmission Target*
40kV/4W Cabled Reflection Target*
50kV/10W Cabled Transmission Target*
50kV/4W Transmission Target*
60kV/12W Transmission Target*
70kV/12W Transmission Target*
Quantity*
Window Type*
Support Structure*
Beryllium Thickness (µm)
Custom Beryllium Thickness (µm)
Beryllium Diameter (mm)
Custom Beryllium Diameter (mm)
Window Attachment Options
Beryllium Coating Options
Window Size (Active Area mm²)
Film Thickness (Angstroms)
Aluminum Thickness (Angstroms)
Quantity*
Mount Drawing
Max. file size: 10 MB.
Detector Selection*
Detector Active Area (mm²)
Assembly Options
Quantity*

「雷射式刻蝕技術」 | Moxtek

「雷射式刻蝕技術」

We use our proprietary nanolithography to create structures with critical dimensions as small as 18 nanometers. Apply this technology in MEMs, semiconductor processes or other advanced nanotechnology opportunities.