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Design for NIL foundry using wire grid polarizer volume production release methodologies on 200mm full wafer NIL

Articles

Volume Manufacturing of Full Wafer Nanoimprint on Wire Grid Polarizers

Nanoimprint Lithography (NIL) has demonstrated the ability to replicate nano-structures within extremely tight […] View document

Papers

Process Repeatability in Volume Manufacturing of Nanostructures Utilizing Nanoimprint Lithography

Datasheets

HPC 350W 75kV X-ray Tube Datasheet

Moxtek HPC 350W 75kV X-ray tubes are designed to be used in XRF applications and imaging applications. View document

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Moxtek in Space Again – Mars Perseverance Rover Landing 2021

MOXTEK (Orem, UT) is excited to celebrate the landing of the Perseverance rover in the Mars Jezero crater on F […] View document

Datasheets

MoxHPC 150W 60kV X-ray Tube Datasheet

Moxtek HPC 150W 60kV X-ray tubes are designed to be used in XRF and imaging applications. The tube is designed […] View document

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HHXRF target selection guidelines

The basic premise of XRF is that high energy x-rays are aimed at a sample and then the atoms in the sample may […] View document

Notes

Polarizer Handling, Care and Cleaning Technical Note

ProFlux wire-grid polarizers are made of mirror quality aluminum patterned on glass wafers. The size and struc […] View document

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Nanoimprint Capabilities

MOXTEK has developed 8-inch nanoimprint processes to manufacture subwavelength 3-D nanostructures. We offer im […] View document

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Hydrophobic Coating for Wire-Grid Polarizers

MOXTEK’s broadband wire-grid polarizers provide excellent polarization contrast and transmission at wide cone […] View document

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